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TOPIC AREA: Optics
COURSE DESCRIPTION:
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This course will address the theory, development, and application of high-resolution optical microscopy with a concentration on near-field scanning optical microscopy. It is designed for engineers, scientists, managers, and optical professionals interested in using high-resolution microscopy to examine optical properties of materials and devices beyond the diffraction limit.
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The course will review the basics of optics and microscopy near the diffraction limit, including the basic principles of beam optics, resolution limitations, and scanned-probe microscopy. Advanced topics to be covered include the theory of near-field scanning optical microscopy and scanned probe microscopes; the design, construction, and assessment of near-field microscopes; and the application of near-field microscopy to waveguides, photonic devices, and semiconductor characterization, including the solid-immersion-lens microscope and ultra-resolution microscopy techniques in biological and semiconductor systems. One novel element of the course will be its use of in-lab demonstrations in which the instructor will demonstrate the design, preparation, and use of near-field optical microscopes in several experiments.
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PRESENTER:
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Dr. M. Selim Unlu was born in Sino, Turkey, in 1964. He received his B.S. degree in electrical engineering from Middle East Technical University, Ankara, Turkey, in 1986, and M.S.E.E. and Ph.D. in electrical engineering from the University of Illinois, Urbana-Champaign, in 1988 and 1992, respectively. His dissertation topic dealt with resonant cavity enhanced (RCE) photodectors and optoelectronic switches.
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From 1984 to 1986, he was a part-time research engineer with Miltary Electronics, Inc. Ankara, Turkey, where he worked on VHF communications systems. In 1992, he joined the Department of Electrical and Computer Engineering, Boston University, as an assistant professor, and he has been an Associate Professor since 1998. From January to July 2000, he worked as a visiting professor at University of Ulm, Germany. His current research interests include design, fabrication, characterization, and modeling of semiconductor optoelectronic devices, especially photodectors, near field and picosecond spectroscopy, semiconductor material characterization, thermal imaging, intergrated bio-sensors, and hyperpolarized noble gas MRI.
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During 1994-1995, Dr. Unlu served as the Chair of IEEE Laser and Electro-Optics Society, Boston Chapter, winning the LEOS Chapter-of-the-Year Award. He served as the vice president of SPIE New England CHapter in 1998-1999. He was awarded National Science Foundation Research Initiation Award in 1993, United Nations TOKTEN award in 1995 and 1996, and both the National Science Foundation CAREER and Office of Naval Research Young Investigator Awards in 1996.
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Dr. Unlu is a recognized expert on photodetectors. He has presented many invited lectures and participated in international conference organizations. Dr. Unlu has authored and co-authored more than 100 technical articles and several book chapters and magazine articles; edited one book; holds one US patent: and has several patents pending. He is currently serving as the chair of the IEEE/LEOS technical subcommittee on photodetectors and imaging.
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PRESENTER:
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Dr. Bennett B. Goldberg is an Associate Professor of Physics and of Electrical Engineering and Computer Engineering at Boston University. He came to Boston University in 1989 following a Bantrell post-doctoral appointment at the Massachusetts Institute of Technology and the Francis Bitter National Magnet Lab. He is a member of the American Physical Society, Materials Research Society, and the Laser and Electro-Optics Society of the IEEE. His current research interests include low- and room-temperature near-field scanning optical microscopy and spectroscopy in semiconductors and biological systems; magneto-optics and magneto-transport of low-dimensional electron systems; spectroscopy of wide-gap III-V nitrides; and ultra-sensitive waveguide biosensors.
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TEXTBOOK:
Materials_1, Materials_2, Materials_3, Materials_4
BENEFITS:
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Develop a basic understanding of optics, electronics and optical microscopy.
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Skills learned/competencies
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INTENDED AUDIENCE:
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Engineers and scientists interested in using high-resolution microscopy to examine optical properties of materials and devices beyond the diffraction limit:Technical managers interested in evaluating various techniques for high-resolution microscopy and their applications; optical professional and consultants with general interest in new and novel optical techniques.
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PRODUCER:
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