Note: The following provides a suggested course description,
objectives, and an outline. These may be modified pending discussion with
the Faculty Chairs, proposing faculty, and other curriculum
reviewers.
Course Description: This course examines the
principles and technologies of chemical vapor deposition (CVD) and
physical vapor deposition (PVD) to prepare thin films for microelectronic
applications. Topics include the deposition of
semiconductors, insulators, and metals using low pressure
(LPCVD) and metal-organic (MOCVD) chemical vapor deposition, evaporation,
sputtering, molecular beam epitaxy (MBE), and ion-beam deposition;
control of film properties; measurement of film properties; and
selection of deposition methods for various applications.
