Note: The following provides a suggested course description,
objectives, and an outline. These may be modified pending discussion with
the Faculty Chairs, proposing faculty, and other curriculum
reviewers.
Course Description: Control of dopant profiles
for the formation of shallow junctions needed for submicron devices;
microstructural engineering to utilize Ion implantation defect
microstructures, low-resistivity ohmic contacts, thin oxides with desired
electrical properties, impurity precipitation and electromigration
phenomena including materials science principles and their applications.
Physical properties of materials in small dimensions are expected to be
frequently quite different from the bulk properties. This course deals
with microscopic properties and correlation of microstructures in
submicron regions with corresponding physical properties.
